CORNING, N.Y., Oct. 11 -- Corning Inc. has received a U.S. patent for a calcium fluoride (CaF2) lens blank that supports the advancement of CaF2 materials for the 193 nm and 157 nm microlithography systems. CaF2 represents the next-generation optical material for semiconductor manufacturing applications, the company said. "The production of CaF2 lens blanks is notoriously difficult," said Michael Pell, senior scientist at Corning’s Fontainebleau Research Center in Avon, France. 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