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Jmar Technologies Inc., of San Diego, has received $2 million in funding under a previously announced $34.5 million Department of Defense (DoD) contract for ongoing refinement of its laser-produced plasma (LPP) source for x-ray nanolithography applications. JMAR has been developing the technology under a multiyear contract with the DoD and is producing different soft x-ray wavelengths for applications including x-ray microscopy and x-ray nanoprobe instrumentation. Jmar said lasers it developed for the LPP source are now being used in laser crystal conditioning and advanced microscope...Read full article

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    Published: September 2004
    CommunicationsConsumerdefenseindustrialJmarlaser-produced plasmalifetest systemsMicroscopyNews BriefsoptronicPhotonics Tech Briefssemiconductor laser testsx-ray nanolithographyx-ray nanoprobe

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