Search
Menu
Meadowlark Optics - SEE WHAT

Daily News Briefs

Facebook X LinkedIn Email
Applied Materials Inc. and DuPont Photomasks Inc. have announced a joint development program for advanced photomasks supporting 90-nm and 65-nm technology. The collaboration will bring Applied Materials' newest deep ultraviolet laser-based pattern generation system, the Applied ALTA 4700, into production early next year at DuPont Photomasks' advanced photomask production facility in Round Rock, Texas.    . . .    The Automated Imaging Association (AIA) seeks practical, solutions-oriented presentations for The Vision Show and Conference West, to be held May 17-19 in San Jose, Calif. It said it...Read full article

Related content from Photonics Media



    Articles


    Products


    Photonics Handbook Articles


    White Papers


    Webinars


    Photonics Dictionary Terms


    Media


    Photonics Buyers' Guide Categories


    Companies
    Published: December 2004
    AIAApplied MaterialsAutomated Imaging AssociationCarl Zeiss MeditecCommunicationsConsumerdefenseDuPont PhotomasksFairchild SemiconductorindustrialLaser Diagnostic TechnologiesNews BriefsPhotonics Tech BriefsSensors & Detectors

    We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.