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Deposition Sciences Inc. - Difficult Coatings - LB - 8/23

Deposition Achieves 12 nm/cycle

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Daniel S. Burgess

A team of scientists at Harvard University in Cambridge, Mass., has demonstrated an atomic layer deposition process that yields conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates at a rate of 12 nm per 30-second cycle. The process, which is 100 times faster than such techniques previously demonstrated for silica, may have applications in the production of planar waveguides, microelectromechanical systems and optical filters. The reaction involves alternately introducing trimethylaluminum and tris(tert-butoxy)silanol vapor to a substrate at temperatures between...Read full article

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    Published: January 2003
    Glossary
    microelectromechanical systems
    Refers to micron-size complex machines that have physical dimensions suitable for the fabrication of optical switches for use in state-of-the-art communications networks.
    aluminum oxide nanolaminatesamorphous silicon dioxideBasic ScienceCoatingsmicroelectromechanical systemsoptical filtersplanar waveguidesResearch & TechnologysilicaTech Pulse

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