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Excimer-Laser Metrology Improves Lithography Process Control

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Paolo Alagna, Gregory Rechtsteiner, Ivan Lalovic and Theodore Cacouris, Cymer LLC

Process- and technology-specific correlations can be established for better process control, and to prevent excursions. As Moore’s law marches on, semiconductor manufacturers rely on advances in photolithography – the use of 193-nm ArF excimer lasers, for example, coupled with optical and process techniques to improve resolution and reduce patterning variations. Recent examples of such technologies include advanced reticle designs that correct for optical proximity effects, use of double- or multiple-patterning exposure methods, computational techniques that achieve...Read full article

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