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PI Physik Instrumente - Revolution In Photonics Align LW LB 3/24

Integrated Fabrication Process Demonstrated for Metal-Oxide EUV Photoresist

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LEUVEN, Belgium, March 8, 2016 — The first integrated patterning process for next generation high-resolution devices using a nonchemically amplified metal containing photoresist and EUV lithography has been presented by nanoelectronics research center imec along with EUV photoresist developer Inpria Corp. of Corvallis, Ore., and Tokyo Electron Ltd. (TEL) of Tokyo, a semiconductor/flat panel display production equipment company. A novel metal-oxide photoresist-based fabrication method has been demonstrated for material patterning. Courtesy of imec. The novel metal-oxide photoresist-based method enables a significant...Read full article

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    Published: March 2016
    Glossary
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    nano
    An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
    industrialEuropeBelgiumIMECTELinpriaDisplayslithographymaterials processingnanoResearch & TechnologyTechnology News

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