SAN DIEGO, June 29 -- Jmar Technologies Inc. announced it is developing an x-ray microscope (XRM) product line based on the company's existing collimated plasma lithography (CPL) x-ray source technology. The new product will enable 3-D visualization of single cells and polymers at sub-50 nanometer resolution using x-ray tomography. The x-ray microscope is an important complement to the transmission electron microscope. X-ray microscopy is currently carried out at several synchrotron facilities. Jmar said it is working with a federally funded national research center to form an alliance for joint technical exchange and to prepare for initial operation, characterization and demonstration of the apha model of its x-ray microscope in early 2006. Ronald A. Walrod, Jmar president and CEO, said the products will cost between $0.5 million and $2 million. He added, "Just as the tabletop x-ray microscope is made possible by many years of R&D directed at lithography applications, production of this commercial instrument will mature the x-ray source as a standard product, to the benefit of CPL." Jmar said it is also evaluating a plan to develop an x-ray nanoplasma instrument product line for surface characteristic analysis, machining and materials deposition to 20-nanometer resolution. The instruments would use the same x-ray source as the x-ray microscope and could have applications in the nanotechnology, chemical and materials industries, the company said. For more information, visit: www.jmar.com