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Loopstra, Banine Named Finalists for EPO Inventor Award for Advances in EUV Lithography

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OBERKOCHEN, Germany, May 28, 2018 — Zeiss’ Erik Loopstra and ASML’s Vadim Banine have been nominated by the European Patent Office (EPO) as finalists for the 2018 European Inventor Award in the "industry" category for their inventions in the field of extreme UV (EUV) lithography. Vadim Banine (left), director of research at ASML, and systems engineer Erik Loopstra in front of a model of an ASML extreme UV lithography system. Courtesy of Zeiss. Loopstra and Banine’s key invention has made it possible to create geometric patterns on silicon wafers – the basis of the microchip – at a...Read full article

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