Search
Menu
Meadowlark Optics - SEE WHAT

Masks Team Up to Beat Light's Limits

Facebook X LinkedIn Email
Aaron J. Hand

The wavelength of exposure light is an inherent limitation in optical lithography. Semiconductor manufacturers are making use of shorter-wavelength lasers, larger numerical apertures and resolution-enhancement techniques to print today's tiny circuits, but these methods are still ultimately limited by the light's wavelength. Scientists at Lucent Technologies' Bell Laboratories have developed a photolithography technique that overcomes that limitation. The two-step etch process -- which uses standard lithographic tools -- is bound only by processing capabilities. Using a stepper with good...Read full article

Related content from Photonics Media



    Articles


    Products


    Photonics Handbook Articles


    White Papers


    Webinars


    Photonics Dictionary Terms


    Media


    Photonics Buyers' Guide Categories


    Companies
    Published: February 2000
    industrialResearch & TechnologyTech Pulse

    We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.