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Deposition Sciences Inc. - Difficult Coatings - LB - 8/23

Multilayer Coating Shows Atomic Precision

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Daniel C. McCarthy

Extreme-ultraviolet wavelengths don't transmit well, even through gaseous materials like air. Consequently, the EUV lithography prototype stepper being developed by a consortium of government and semiconductor industry partners steers its 13.4-nm beam using nine reflective optics: four condenser optics, a reflective mask and four projection optics, which image the mask pattern onto the wafer. The thickest and thinnest parts of the multilayer coatings on these mirrors cannot differ by more than one extra layer of atoms. This degree of thickness control, essential to optics for extreme-UV...Read full article

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    Published: August 2002
    Basic ScienceCoatingsindustrialResearch & TechnologyTech Pulse

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