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New Approach to Coherent Extreme-UV Emissions Could Be Used in Lithography

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A new way to generate extreme-UV emissions using intense laser pulses, discovered by a team at the Institute for Basic Science (IBS), promises to find applications in high-resolution imaging, lithography, and ultrafast spectroscopy. When a strong laser shines on helium gas atoms, electrons transition from ground to excited state. The excited atoms then emit light corresponding to the energy difference between the two states and the electrons come back to their original ground state. The general belief is that this happens when the atoms absorb several light particles. However, according...Read full article

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    Published: October 2018
    Research & TechnologyAsia-PacificeducationLasersLight Sourcesultrafast photonicsspectroscopypulsed lasersultrafast lasersImagingIBSInstitute for Basic Scienceextreme UVmeandering electronsfrustrated tunneling ionizationTech Pulse

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