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Newly Created Molecules Drive Lithography Technique

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ATLANTA, March 30, 2007 -- New two-photon absorbing molecules that are sensitive to light at short wavelengths are helping to produce 3-D polymer line structures as small as 65 nm wide. The 3-D multiphoton lithography technique could compete with existing processes for making nanoscale electronic, photonic and microfluidic devices.A Georgia Institute of Technology research team led by Joe Perry (left, with researcher Vincent Chen) has produced 3-D polymer line structures as small as 65 nm wide using new two-photon absorbing molecules. (Georgia Tech Photo: Gary Meek) Fabricating such small features (a nanometer is...Read full article

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