SEATTLE, July 3, 2012 — Work over the past decade to harness the energy-generating mechanism of the sun has now yielded bright high-energy light needed to etch smaller microchips. The microchip industry now uses 193-nm UV light, which cannot etch circuits any smaller than those currently being made. The future standard for making microchips, the industry has determined, is 13.5-nm light. To create such extreme-UV light, high-temperature, electrically charged gases called plasma are necessary; until now, however, scientists have struggled to generate enough power with the extreme-UV light sources that exist. ...Read full articleRelated content from Photonics MediaARTICLESLight-Based ‘Tractor Beam’ Generated for Nanoscale AssemblyResearchers from the University of Washington (UW) have developed a method that could make reproducible manufacturing at the nanoscale possible. 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