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Plasma’s potential for photolithography pursued

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Work over the past decade to harness the energy-generating mechanism of the sun has yielded bright high-energy light needed to etch smaller microchips. The microchip industry now uses 193-nm UV light, which cannot etch circuits any smaller than those currently being made. The future standard for making microchips, the industry has determined, is 13.5-nm light. Creating such extreme-UV light requires high-temperature, electrically charged gases called plasma, but scientists have struggled to generate enough power with existing extreme-UV light sources. “Over the past decade,...Read full article

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