AUSTIN, Texas & ALBANY, N.Y., Feb. 7 -- The University at Albany (UAlbany) and International SEMATECH (ISMT), a consortium of semiconductor manufacturers, have completed negotiations on a joint five-year program to accelerate the development of next-generation lithography. Under the contract, ISMT will conduct a program in extreme ultraviolet (EUV) lithography infrastructure, focused on advanced work in three areas -- mask blanks, resist and EUV extensions -- at UAlbany's new 300 mm wafer cleanroom complex. The program is being called International SEMATECH North. With the construction of two...Read full articleRelated content from Photonics MediaArticlesOSARO Teams with Cognex to Streamline E-Commerce, Logistics FunctionsSan Francisco-based piece-picking solutions provider OSARO has integrated Cognex DataMan image-based barcode readers into its robotic bagging system. 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