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Deposition Sciences Inc. - Difficult Coatings - LB - 8/23

Schott Researchers Develop New Phase-Shift Material

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Anne L. Fischer

A research and development team in Meiningen, Germany, has developed an advanced phase-shift material for Schott Lithotec AG of Jena, Germany. The material is suitable for 157-, 193- and 248-nm lithography, such as for use in DRAM memory and logic applications. Mask blanks offer the ability to independently adjust phase and transmission for specific applications in 157-, 193- and 248-nm lithography. As feature sizes on semiconductor integrated circuits have shrunk, the wavelength used in the lithographic patterning of those features has become increasingly important. Schott's material...Read full article

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    Published: July 2004
    Glossary
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    DRAM memoryindustriallithographylogic applicationsphase-shift materialResearch & Technologyresearch and developmentSchott Lithotec AGTech Pulse

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