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Self-Assembling Fabrication Method Offers Alternative to Photolithography

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CAMBRIDGE, Mass., Feb. 2, 2016 — Block copolymers — molecules that spontaneously self-assemble into useful shapes — are a promising alternative to photolithography techniques for manufacturing nanoscale circuits. Researchers from the Massachusetts Institute of Technology have described what they say is the first technique for stacking layers of block-copolymer wires such that the wires in one layer naturally orient themselves perpendicularly to those in the layer below. The ability to easily produce such "mesh structures" could make self-assembly a much more practical way to manufacture memory,...Read full article

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