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TRW Delivers First Laser for Next-Generation Microchips

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REDONDO BEACH, Calif., April 6 -- TRW Inc. says it has delivered the first next-generation laser for extreme ultraviolet (EUV) lithography. The company calls the laser an enabling technology for a new type of EUV light source that will allow chip manufacturers to keep up with world demand for smaller and faster microcircuits for the next 10 to 15 years. The laser was developed under a joint agreement signed in 1997 between TRW and the EUV Limited Liability Company, a consortium of US semiconductor manufacturers led by Intel, Motorola and Advanced Micro Devices. EUV sources will allow circuit...Read full article

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    Published: April 1999
    industrialNews & Features

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