With self-neutralizing Ion Assisted Deposition from Denton Vacuum, you’ll produce denser films with less scatter than with evaporative deposition only, but without the cost and low throughput of Ion Beam Deposition. Ion Assisted Deposition provides high-quality, defect-free, low-stress, environmentally-stable (shift-free) films required by the most demanding optical applications. You’ll benefit from: • Independent control of ion current density and ion energy to optimize film properties • Long-term operation with 100% O2 or N2 reactive gases for stable operation with no process drift for extended runs Self-neutralizing Ion Source The proprietary RF source design enables full neutralization without filaments, plasma bridge neutralizer or hollow cathode. This results in: • Reduced cost of ownership • Long mean time between maintenance (MTBM) Last, the Endeavor doesn’t require a costly variable matching network, thereby, increasing reliability and lowering acquisition costs. Ask us about our self-neutralizing Ion Source at SVC TechCon 2017, booth 726, next week in Providence, RI! Want to learn more? Read our infographic: 5 Benefits of Ion Assisted Deposition, or our white paper: Characterization of a Plasma Ion Source and of Ion Assisted Deposited Optical Thin Films. About Denton Vacuum Denton Vacuum enjoys a long history of bringing new innovations to the field of thin film optical coatings, from the pioneering work of our founder Richard Denton to our most recent innovation, Denton’s Endeavor Ion Source for Ion Assisted Deposition. Today, Denton deploys its filament-free RF source technology included in our Electron Beam Evaporation Systems, Sputtering Physical Vapor Deposition Systems and Plasma Enhanced Chemical Vapor Depositions to deliver the highest performance films at the lowest cost.