DITZINGEN, Germany, Oct. 25, 2017 — Machine tool and laser systems developer Trumpf GmbH & Co. KG has acquired an 85 percent stake in CO2 laser developer Access Laser Co. With this acquisition, Trumpf aims to integrate a part of the extreme ultraviolet (EUV) technology supply chain. Access’ lasers are used to fabricate microchips in EUV lithography, where the light generated by the low-power CO2 lasers serves as a beam source deployed together with Trumpf laser amplifiers in EUV systems. “Access Laser is a core partner in our EUV business and a highly innovative laser company,” said Peter...Read full articleRelated content from Photonics MediaARTICLESIntegrated Optical System Helps Contain COVID-19 in AirportsWill automated infection tracking become standard procedure in airports around the world? 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