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PI Physik Instrumente - Revolution In Photonics Align ROSLB 3/24

Two Imaging Elements Create One Multipattern Mask

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Hank Hogan

Inspired by a species of thousand-eyed, ocean-dwelling brittle star, investigators at the University of Pennsylvania in Philadelphia, Massachusetts Institute of Technology in Cambridge and Bell Labs in Murray Hill, N.J., have demonstrated that two imaging elements -- a microlens and clear windows, or pores -- can be used to create a multipattern photomask. Utilizing an array of the two elements, the research group fabricated different structures by varying the array-to-substrate spacing, the intensity of the light source and the resist tone. Inspired by the calcite microlens arrays on the...Read full article

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    Published: August 2005
    Glossary
    photomask
    A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision plate or glass substrate that carries a pattern of opaque and transparent regions. Photomasks are crucial for transferring intricate patterns onto semiconductor wafers during the photolithography process. The photomask is typically placed in the optical path between a light source and a...
    industrialLight SourcesmicrolensphotomaskResearch & TechnologyTech PulseUniversity of Pennsylvania

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