Aledia, a developer and manufacturer of next-generation 3D LEDs for display applications, has selected Veeco Instruments Inc.’s Propel GaN metal-organic chemical vapor deposition (MOCVD) system to support advanced R&D. “We believe that the opportunity for our breakthrough nanowire-LED display technology on large-area silicon is very large, and we need the best and most scalable technology available to support our continued R&D around 3D display applications,” said Giorgio Anania, CEO, chairman, and co-founder of Aledia. “We believe Veeco is best positioned. Veeco’s cutting-edge Propel system delivers unsurpassed results and very good homogeneity throughout the entire wafer, making it the best choice and one we know will help us continue to push the limits of innovation.” Aledia noted Propel’s large process window, single-wafer reactor technology, and defect stability as key factors in its decision to adopt the Propel system. The system’s single-wafer reactor platform enables the processing of 6- and 8-in. wafers or 2- to 4-in. wafers in a minibatch mode. In addition to Veeco’s proprietary TurboDisc technology, the system also includes Veeco’s IsoFlange and SymmHeat technologies, which provide homogeneous laminar flow and uniform temperature profile across the entire wafer. “On the heels of the company’s previous adoption of Veeco’s K465i MOCVD system, Aledia’s decision to turn to Veeco once again to support future generations of nanowire-LED technologies for mobile displays is a testament to our shared commitment to excellence,” said Peo Hansson, senior vice president and general manager of MOCVD at Veeco. “We look forward to our continued partnership and to support Aledia as it continues to innovate new discoveries in the LED space.” Display technology developers are focusing on the next big technological shifts such as micro-LED and 3D LED. Industry analysts predict a scenario where the market for advanced LED displays could potentially reach 330 million units by 2025.