Rudolph Joins Sematech Metrology Program at CNSE

Rudolph Technologies Inc. of Flanders, N.J., announced that it is the first semiconductor equipment supplier to join Sematech's metrology program at the College of Nanoscale Science and Engineering (CNSE), located at the University at Albany. Under the membership agreement, Rudolph, a provider of process-characterization equipment and software for thin-film measurement and macro-defect inspection, and Sematech, a consortium of chipmakers, will jointly establish an International Process Characterization (IPC) program to focus on integrated metrology, inspection and yield-enhancement software solutions to address critical process characterization challenges for semiconductor manufacturing at the 32-nm technology generation and beyond. The IPC program, which brings together expert researchers and technologists and critical tools and software, will serve as a foundation to Sematech's expanding metrology programs at the CNSE's Albany NanoTech Complex. Rudolph will team with Sematech's members and the members of ISMI (International Sematech Manufacturing Initiative) to accelerate the development and application of measurement methods for advanced semiconductor technologies. The initial IPC program addresses the metrology of thin films and metal gate stacks; wafer front, back, and edge macro-defect inspection; inspection and metrology for through silicon vias (TSV) and 3-D integrated circuits (3DIC); immersion lithography process characterization; process modeling and optimization for yield enhancement; and automatic defect classification (ADC). The program also aims to establish benchmarks for cost-effective solutions by including cost-of-ownership criteria in all projects.

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About Rudolph Technologies Inc.

Published: February 2008

Glossary

lithography: Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
metrology: Metrology is the science and practice of measurement. It encompasses the theoretical and practical aspects of measurement, including the development of measurement standards, techniques, and instruments, as well as the application of measurement principles in various fields. The primary objectives of metrology are to ensure accuracy, reliability, and consistency in measurements and to establish traceability to recognized standards. Metrology plays a crucial role in science, industry,...
nano: An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
photonics: The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...

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