Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics Spectra BioPhotonics EuroPhotonics Vision Spectra Photonics Showcase Photonics ProdSpec Photonics Handbook

VLSI, Numerical Technologies Eye Optics for Chip Design

Facebook Twitter LinkedIn Email Comments
SAN JOSE, Calif., May 4 -- VLSI Technology, Inc. and Numerical Technologies, Inc. have formed a joint development relationship to focus on the design and manufacture of sub-0.15 micron circuits. VLSI plans to use NumeriTech's optical proximity correction product to manufacture the circuits; it is also evaluating NumeriTech's phase shifting product for use in this process.
The current generation of optical lithography equipment prints IC designs onto wafers at 248 nm, the wavelength of light. When IC features such as the gates on transistors are smaller than this wavelength, features become distorted or disappear completely. NumeriTech is addressing the problem by integrating phase shifting and optical proximity correction into each step of the manufacturing process, including design layout, mask manufacturing, process development, and silicon fabrication. VLSI expects to incorporate the NumeriTech technology into production use by the second half of 2000.

Photonics.com
May 1999
industrialNews & Features

Comments
back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2020 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA, [email protected]

Photonics Media, Laurin Publishing
x We deliver – right to your inbox. Subscribe FREE to our newsletters.
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.