Precision grinding coolants, abrasive lapping/polishing and CMP (chemomechanical polishing, planarizing) slurries, cleaners, and polishing pads for the critical surface finishing of semiconductor, optical/electro-optical and hard, brittle materials. Products are formulated from a cleaning perspective to facilitate surfaces for epitaxial deposition.
Established: 1984
Employees: 30
Facility area (sq ft): 12,000
Ownership type: Publicly Traded Stock