Precision grinding coolants, abrasive lapping/polishing and CMP (chemomechanical polishing, planarizing) slurries, cleaners, and polishing pads for the critical surface finishing of semiconductor, optical/electro-optical and hard, brittle materials. Products are formulated from a cleaning perspective to facilitate surfaces for epitaxial deposition.
This listing has not been verified by the company. If you know of a change to this information, please
email our editors.