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Electron-Beam Lithography Systems

An electron-beam lithography system is a sophisticated nanofabrication tool used in the semiconductor industry and research laboratories to pattern extremely fine features with sub-micrometer or even nanometer-scale resolution. EBL systems utilize a focused beam of electrons to directly write patterns onto a substrate coated with a thin layer of electron-sensitive resist material. Learn more about electron-beam lithogrphy systems →

Clear All Filters xElectron-Beam Lithography Systems x
Advantest Corp. - Tokyo, Japan
JEOL USA Inc. - Peabody, MA
SIMTRUM Pte. Ltd. - Singapore, Singapore
STS-Elionix - Wellesley Hills, MA
Vistec Electron Beam GmbH - Jena, Germany
Glossary
  • electron-beam lithography system An electron-beam lithography (EBL) system is a sophisticated nanofabrication tool used in the semiconductor industry and research laboratories to pattern extremely fine features with sub-micrometer or even nanometer-scale resolution. EBL systems...
Electron-Beam Lithography Systems Supplierslasersopticsnanofabricationnano fabricationsemiconductorEBLelectron-sensitive resist material

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