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Electron-Beam Lithography Systems

An electron-beam lithography system is a sophisticated nanofabrication tool used in the semiconductor industry and research laboratories to pattern extremely fine features with sub-micrometer or even nanometer-scale resolution. EBL systems utilize a focused beam of electrons to directly write patterns onto a substrate coated with a thin layer of electron-sensitive resist material. Learn more about electron-beam lithogrphy systems →

The Photonics Buyers' Guide is a comprehensive resource for verified providers of Electron-Beam Lithography Systems. Profiles and contact information for manufacturers and suppliers are provided by the companies and verified by our editors. If you have updated information about any of the organizations listed, please contact us.

Glossary

electron-beam lithography system An electron-beam lithography (EBL) system is a sophisticated nanofabrication tool used in the semiconductor industry and research laboratories to pattern extremely fine features with sub-micrometer or even nanometer-scale resolution. EBL systems...

lasersopticsnanofabricationnano fabricationsemiconductorEBLelectron-sensitive resist material

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