Photonics SuppliersThin-Film Deposition Equipment
Kaufman & Robinson

Kaufman & Robinson Inc.

Map1330 Blue Spruce Dr.
Fort Collins, CO 80524-2030
United States
Phone: +1 970-495-0187
Toll-free: +1 866-846-4514
Kaufman & Robinson (KRI®) is a privately-held corporation located in Fort Collins, Colorado, USA.  We are a full-scale manufacturer of commercial ion, plasma sources and power supply controllers.  Our products are installed throughout the world with high-tech industrialists, vacuum system OEMs and research institutions.  Our core activities include basic research, product development, integrated manufacturing and applications support. 

KRI is committed to elevate its product technology to new levels of process tools.  Rich in scientific talent, KRI® continues to invent the next generation products.  Since the introduction of the Kaufman source, Kaufman & Robinson has produced numerous broad beam designs.  These advanced designs encompass gridded, gridless source technology and switched-mode power supplies.  The innovations incorporated into these products have propelled better performance standards, uptime reliability and novel material processes. 

Our technical originality has been reinforced by the significant number of patents awarded to Kaufman and Robinson.  In addition, KRI®’s knowledge of ion beam technology, processes and applications has been shared with the process community.  The KRI® staff has authored over 100 articles, publications, books, and technical papers which are available to the marketplace. 

With over 50 years of experience in commercial ion source technology for research and production applications, we can supply you the ion source that will best fit your application and to help meet your objectives.
Established: 1978
Employees: 35
Facility area (sq ft): 24,000
Ownership type: Privately Owned
Richard Serrano, President
Christopher Griffith, Sales Director
James Kahn, Director of Research & Development

KRI RFICP Social Video - Kaufman & Robinson
Buyers' Guide Print Ads
opticslasersion sourceplasma sourceetchingion assisted depositionIADsubstrate pre-cleaningsurface modificationion beam sputteringion beam figuringvacuum
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.
Vision Spectra Conference 2024LIVE NOW: Eliminating Distortion in Machine Vision Applications X