HASTILITE Ceria-Base Polish

• Model: HASTILITE Ceria-Base Polish
• Company: Universal Photonics Inc.
• Type: Polishing Material and Pads
• pH: 6 - 7
• Particle Count D50 (μm): 0.4 - 0.7
• PO Density (g/mL): 1.50 - 1.68
• PO ULTRA Density (g/mL): 1.50 - 1.57
• PO Solid Content: 40 - 50
• PO ULTRA Solid Content: 40 - 44

HASTILITE PO and HASTILITE PO ULTRA meet stringent optics specifications with 90% APS < 1.0 µm. High ceria-base yields sleek-free finishes on softer glass, while producing extremely low scatter on harder glass and ceramic materials. PO and PO ULTRA’s versatility addresses high speed polishing needs in a wide variety of polishing systems, including super-polishing, pitch polishing or LP pad polishing.