Search
Menu
Photonics ProductsOptics & Optical FabricationOptical Fabrication AccessoriesPolishing Material and Pads

SC-955 PAD

  • Company: Universal Photonics Inc.
  • Type: Polishing Material and Pads
  • Density (g/cm3): 0.30 - 0.42
  • Removal Rate (µm/min): 0.68
  • Size Availability: Custom
  • PSA Backing: Yes

SC-955 PAD for High-Pressure Applications

SC-955 is the material of choice for applications where higher removal rates and consistent flatness are required. Key to SC-955’s superior performance is its tightly controlled pore structure. Small and consistent throughout the polyurethane architecture, the pores “meter” external polishing or finish slurries while supporting uniform points of contact between the pad and working surface.
SC-955 PAD

Universal Photonics Inc.
85 Jetson Lane
Central Islip, NY 11722
United States
Phone: +1 516-935-4000
Fax: +1 516-935-4039
Toll-free: +1 800-645-7173
Twitter Facebook LinkedIn
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.