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Off-axis Wavefront Measurement

To ensure the implementation of the complex optical designs, a qualified measuring technology must be used. Wavefront measurement is particularly well-suited for this purpose, since it determines the image quality on a spatially-resolved basis, i.e. over all field angles, and across the entire sample aperture. In particular with wide-angle lenses, high-quality imaging of abaxial objects is key. Here, mere on-axis wavefront measurements are often not sufficient because high field angles are not taken into account.

Therefore, TRIOPTICS now offers a solution to cover this application: WaveMaster^® Field. The WaveMaster^® Field was explicitly designed for use in research and development. The system enables both the comprehensive measurement of samples across their entire field of view at field angles up to 70° and a subsequent in-depth analysis. Individual incident angles and wavelengths can be flexibly adjusted in just a few steps to simulate changing lighting conditions.

Adaptations to different samples can be made just as easily. Like the systems for measuring on-axis wavefronts, the integrated WaveSensor^® 150 also delivers high off-axis measuring accuracy of up to λ/20 (RMS) and a repeatability of λ/200 (RMS). In addition, the off-axis measurement increases the sensitivity with respect to the lens centering, so that the lens positioning to the desired wavefront can be optimized even more precisely.More products