Photonics Dictionary

mask proximity correction

A technique used in photolithography of computer chips to compensate for errors caused by the proximity effect, which results in variations in size between areas of the mask that have many small openings and areas that have isolated openings. The correction is accomplished by deliberately enlarging certain features on the mask.
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.