Search
Menu
Photonics Dictionary

near-field holography

A lithography method that allows the transfer of fine-pitch gratings from a phase mask into photoresist. The exposure takes place with the light coming under an oblique angle to the mask. The interference between the zeroth and first diffraction orders reproduces the precise pitch of the grating found on the mask.
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.