OSA 2015 International Workshop on Compact EUV and X-Ray Light Sources

This year’s workshop will be collocated with the International Symposium on Extreme Ultraviolet Lithography to be held in Maastricht, Netherlands. This will continue to build upon the work began at the 2013 Incubator again providing a unique opportunity for the EUV and X-ray light source developers to interact with potential semiconductor industry users, learn about their fundamental and practical needs, and assess the current status of EUV/Soft X-ray sources. The two programs will coordinate to encourage interaction / discussion between the compact x-ray source developers and the end users.