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SPIE Advanced Lithography 2014

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February 23, 2014 - February 27, 2014
San Jose Marriott and San Jose Convention Center
San Jose, CA
SPIE
(360) 676-3290

About this Event
Reasons to exhibit at SPIE Advanced Lithography 2014 include Connecting with 2,300 attendees; Ability to get face-to-face interaction with potential customers from 5 days of presentations, courses, and special events; and 50 exhibiting companies were involved in 2013.

Papers will be accepted in the following areas: Advanced Etch Technology for Nanopatterning; Extreme Ultraviolet (EUV) Lithography; Alternative Lithographic Technologies; Metrology, Inspection, and Process Control for Microlithography; Advances in Resist Materials and Processing Technology; Optical Microlithography; and Design for Manufacturability through Design-Process Integration.


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