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Electron-Beam Lithography Systems

An electron-beam lithography system is a sophisticated nanofabrication tool used in the semiconductor industry and research laboratories to pattern extremely fine features with sub-micrometer or even nanometer-scale resolution. EBL systems utilize a focused beam of electrons to directly write patterns onto a substrate coated with a thin layer of electron-sensitive resist material. Learn more about electron-beam lithogrphy systems →

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Advantest Corp. - Tokyo, Japan

Glossary

electron-beam lithography system An electron-beam lithography (EBL) system is a sophisticated nanofabrication tool used in the semiconductor industry and research laboratories to pattern extremely fine features with sub-micrometer or even nanometer-scale resolution. EBL systems...

Electron-Beam Lithography Systems Supplierslasersopticsnanofabricationnano fabricationsemiconductorEBLelectron-sensitive resist material