Photonics Dictionary

Chemical vapor deposition (CVD) equipment refers to a class of specialized apparatus used in the process of chemical vapor deposition, a technique for depositing thin films of various materials onto...

An optical interference coating, vacuum-deposited on a circular substrate, whose transmission characteristics may be varied by physical rotation.

Coating carried out in a sealed chamber evacuated by a mechanical pump in series with an oil diffusion pump to a pressure less than 10-4 mm of mercury, measured by a vacuum gauge. At such a low...

Ion-beam sputtering (IBS) is a physical vapor deposition (PVD) technique used for depositing thin films onto substrates. It involves bombarding a target material with a beam of energetic ions,...

A colorless, crystalline compound whose low refractive index (n = 1.38) makes it effective as a lens antireflection coating when deposited by thermal evaporation in a near vacuum. This process...

Reactive evaporation refers to a process in thin-film deposition where a material is deposited onto a substrate through evaporation, and chemical reactions take place during or after the evaporation...

A vacuum deposition method in which the coating material (target) is removed from the surface of the coating source (cathode) by ion bombardment and deposited upon the substrates.

Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface...

A sputtering target is a solid material used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds...