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Sputtering Targets

A sputtering target is a solid material used in the process of physical vapor deposition, specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds and serve as the source material from which atoms or ions are ejected during the sputtering process to deposit thin films onto a substrate surface. Learn more about sputtering targets →

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GfE Fremat GmbH, Coating Materials - Brand-Erbisdorf, Germany
Cotec GmbH - Karlstein, Germany
FHR Anlagenbau GmbH - Ottendorf-Okrilla, Germany
PhotonExport - Esplugues de Llobregat, Spain
PI-KEM Ltd. - Tamworth, United Kingdom
SurfaceNet GmbH - Rheine, Germany
Glossary
  • sputtering A vacuum deposition method in which the coating material (target) is removed from the surface of the coating source (cathode) by ion bombardment and deposited upon the substrates.
  • sputtering target A sputtering target is a solid material used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds and serve as the source material from which atoms or...
Sputtering Targets Supplierssputtering machinesmetallizing equipmentvacuum equipmentPVDphysical vapor depositionmaterialsoptics

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