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Sputtering Targets

A sputtering target is a solid material used in the process of physical vapor deposition, specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds and serve as the source material from which atoms or ions are ejected during the sputtering process to deposit thin films onto a substrate surface. Learn more about sputtering targets →

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Plasmaterials Inc. - Livermore, CA
Angstrom Sciences Inc. - Duquesne, PA
Electron Microscopy Sciences - Hatfield, PA
Himet Materials - Morgan Hill, CA
Kamis Inc. - Mahopac Falls, NY
Materion Advanced Materials - Buffalo, NY
Michigan Metals & Manufacturing Inc. - West Bloomfield, MI
MSE Supplies LLC - Tucson, AZ
Mustang Vacuum Systems Inc. - Sarasota, FL
Ted Pella Inc. - Redding, CA
Process Materials Inc. - Rocklin, CA
Refining Systems Inc. - Las Vegas, NV
SCI Engineered Materials Inc. - Columbus, OH
Shimifrez Inc. - Vaughan, Canada
STC Material Solutions - St. Albans, VT
Super Conductor Materials Inc. - Suffern, NY
Vacuum Engineering & Materials - Santa Clara, CA
Glossary
  • sputtering A vacuum deposition method in which the coating material (target) is removed from the surface of the coating source (cathode) by ion bombardment and deposited upon the substrates.
  • sputtering target A sputtering target is a solid material used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds and serve as the source material from which atoms or...
Sputtering Targets Supplierssputtering machinesmetallizing equipmentvacuum equipmentPVDphysical vapor depositionmaterialsoptics

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