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APPLICATION NOTE: Characterization of Advanced Semiconductor Materials and Processes with Nanoscale IR Spectroscopy (5/11/2021)

APPLICATION NOTE: Characterization of Advanced Semiconductor Materials and Processes with Nanoscale IR Spectroscopy

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Tuesday, May 11, 2021

WHITE PAPERS & APPLICATION NOTES

Characterization of Advanced Semiconductor Materials and Processes with Nanoscale IR Spectroscopy

This application note demonstrates the successful application of Tapping AFM-IR to distinguish the chemical footprints of several nanoscale lithographic patterns consisting of complex molecular assemblies with excellent spatial resolution of 4 nm. Additionally, nanoscale IR spectroscopy also excels in the characterization of nanoscale defects.

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- Improving Additive Manufacturing with Accurate Surface Metrology
- High-Resolution Chemical Imaging with Tapping AFM-IR

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