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HASTILITE Nano Silicon Polish

  • Company: Universal Photonics Inc.
  • Type: Polishing Material and Pads
  • pH: 8 - 10
  • % Solids: 15 - 20
  • SiC Content (%): 50+
  • Particle Size D50 (μm): 0.110 - 0.140
  • Particle Size D99 (μm): < 0.389
  • Size Availability: 1pt, 1l, 1gl

HASTILITE NANO-SiC 100 is an aqueous slurry of hexagonal SiC crystals. This abrasive maximizes cut rates, while minimizing subsurface damage. The chemical inertness to most acids and bases, in combination with its heat and abrasion resistance, makes HASTILITE NANO-SiC suitable for extreme polishing conditions. HASTILITE NANO-SiC can be used on silicon, sapphire, SiC wafers and ceramic-based substrates.
HASTILITE Nano Silicon Polish

Universal Photonics Inc.
85 Jetson Lane
Central Islip, NY 11722
United States
Phone: +1 516-935-4000
Fax: +1 516-935-4039
Toll-free: +1 800-645-7173
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