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ETCH PROCESS MONITORING

Photonics Spectra
Jan 2002
MKS Instruments Inc.Request Info
 
The Spectra Vision 1000-C and -E in situ process monitoring systems from MKS Instruments Inc. continuously collect and interpret data from chemical vapor deposition process tools and etch tools using a closed ion source analyzer and a close-coupled automated inlet. The Unibloc inlet valve automates the sampling of background and process gases with the recipe-driven software. The valve and analyzer are automatically isolated from the process chamber and purged with inert gas to keep the source clean when the systems are not sampling.


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