KrF LIGHT SOURCE
Jun 2002Cymer Inc.Request Info
A krypton fluoride production light source for use in semiconductor manufacturing has been unveiled by Cymer Inc. The ELS-7000 is designed for next-generation lithography applications at 248 nm and provides a repetition rate of 4 kHz and output power of 30 W. The light source also offers variable energy and repetition rate operation for increased process latitude; the MicroInject, for minimized operational downtime; and high-accuracy tuning technology for wavelength stability. The ELS-7000 is suitable for use with 200- and 300-mm lithography scanners whose lenses have numerical apertures of >0.8.