Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
share
Email Facebook Twitter Google+ LinkedIn

THIN-FILM METROLOGY

Photonics Spectra
Dec 2002
Scientific Computing InternationalRequest Info
 
The FilmTek 2000M-DUV thin-film metrology tool from Scientific Computing International is suitable for research and development and for volume production of 90-nm semiconductor devices. It can monitor wafers for 193-nm deep-UV lithography and can measure thickness and optical film properties simultaneously. Based on broadband spectrophotometry at wavelengths of 190 to 1700 nm, the system provides a measurement spot size as small as 5 µm in diameter. A proprietary algorithm enables full characterization of single- and multiple-layer films with thicknesses from 3 Å to 250 µm for deposition, diffusion, etching and lithography processes.


REQUEST INFO ABOUT THIS PRODUCT

* Message:
(requirements, questions for supplier)
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
Address:
Address 2:
City:
State/Province:
Postal Code:
* Country:
Phone #:
Fax #:

Register or login to auto-populate this form:
Login Register
* Required
Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2017 Photonics Media
x Subscribe to Photonics Spectra magazine - FREE!