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THIN-FILM METROLOGY

Photonics Spectra
Dec 2002
Scientific Computing InternationalRequest Info
 
The FilmTek 2000M-DUV thin-film metrology tool from Scientific Computing International is suitable for research and development and for volume production of 90-nm semiconductor devices. It can monitor wafers for 193-nm deep-UV lithography and can measure thickness and optical film properties simultaneously. Based on broadband spectrophotometry at wavelengths of 190 to 1700 nm, the system provides a measurement spot size as small as 5 µm in diameter. A proprietary algorithm enables full characterization of single- and multiple-layer films with thicknesses from 3 Å to 250 µm for deposition, diffusion, etching and lithography processes.


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