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Photonics Spectra
May 2004
Cymer Inc.Request Info
DEEP-UV LIGHT SOURCE The XLA 105 argon-fluoride excimer light source manufactured by Cymer Inc. is designed to support 65-nm photolithography applications. Based on proprietary master oscillator power amplifier dual-gas-discharge-chamber technology, it is intended for volume production of semiconductor devices. It operates at a 4-kHz repetition rate and delivers 40 W of output to provide full imaging capability for 200- and 300-mm lithography scanners. Bandwidth is ≤0.2 pm FWHM and ≤0.50 pm at 95% energy integral. Pulse duration is ≥=70 ns, reducing peak fluence and increasing the lifetime of the scanner optics.


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argon-fluoride excimer light sourceCymer Inc.industrialNew Productsphotolithography applications

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