Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
share
Email Facebook Twitter Google+ LinkedIn

EXCIMER LIGHT SOURCE

Photonics Spectra
Jun 2004
Cymer Inc.Request Info
 
EXCIMER LIGHT SOURCE Cymer Inc. has announced the XLA 105 argon-fluoride excimer light source, which supports 65-nm photolithography applications. It operates at a 4-kHz repetition rate, outputs at 40 W and provides full imaging capability for 200- and 300-mm lithography scanners. Bandwidth is ≤0.2 pm FWHM and ≤0.50 pm at 95% energy integral, enabling exposure of important semiconductor features with high-numerical-aperture lens designs, and requiring fewer calcium-fluoride elements. Pulse duration is ≥70 ns, which reduces peak fluence for longer scanner optics lifetimes. The device is based on proprietary master oscillator power amplifier technology with dual gas discharge chambers.


REQUEST INFO ABOUT THIS PRODUCT

* Message:
(requirements, questions for supplier)
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
Address:
Address 2:
City:
State/Province:
Postal Code:
* Country:
Phone #:
Fax #:

Register or login to auto-populate this form:
Login Register
* Required
Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2017 Photonics Media
x Subscribe to Photonics Spectra magazine - FREE!
X
Are you interested in this product?
If you'd like Cymer Inc. to reach out to you with more information about this product, please supply your email and they will contact you.

Email Address:
Stop showing me this for the remainder of my visit