Feb 2005Omega Optical Inc.Request Info
I-line interference optical filters for photolithography are available from Omega Optical. Supplied in 124- and 165-mm diameters, the filters are constructed from durable oxide films deposited on fused silica substrates via electron beam with ion-assist for stability over time and varying environmental conditions. They transmit the five lines of the mercury i-line with bandwidth, center wavelength and filter construction designed for maximum throughput and filter life. The company says that the filters, made without epoxies, exceed intensity levels offered by OEM replacement filters by 10% to 20%.