EXCIMER LIGHT SOURCE
Jul 2005Cymer Inc.Request Info
Operating at a maximum repetition rate of 4 kHz and delivering up to 60 W of output power, Cymer Inc.'s XLA 200 excimer light source is designed for immersion lithography applications. The third-generation master-oscillator-power-amplifier-based ArF light source is engineered for the volume production of semiconductors at the 45-nm node. Bandwidth is ≤0.12 pm FWHM and ≤0.25 pm at 95% energy integral.