Request InfoFilmetrics, KLA InstrumentsThe F50 thin-film thickness mapping system from Filmetrics Inc. is designed for semiconductor wafer characterization and optical coating. It automatically measures the thickness of oxides, nitrides, resists, polymers and other films used in silicon, III-V and LCD fabrication. Films between 20 nm and 30 µm thick can be measured on substrates up to 8 in. in diameter. The system also models and characterizes complex multilayer optoelectronic structures such as vertical-cavity lasers and distributed Bragg reflectors.See full productRelated content from Photonics MediaWEBINARSPhotonics.com 6/30/2021European Photonics Manufacturing Services Funded by ECThis event is supported by the European initiatives presented and is moderated by EPIC, the European Photonics Industry Consortium. The European Commission is helping companies access the...Photonics.com 10/27/2021Fiber Optic Solutions for Medical DevicesSteve Allen provides a brief overview and examples of procedures that continue to push adoption and proliferation of optical fiber-based medical devices. From cosmetic surgery to cutting-edge sensing...Photonics.com 7/22/2021STANDARDS UPDATE: Vision Standards: An Overview of Global and A3 DevelopmentsStandards play a key role in the vision and imaging industry by ensuring interoperability of components, increasing market size, and shortening the time it takes to get new products to market. As the...Photonics.com 7/20/2023Motorized and Calibrated Lenses for Machine Vision ApplicationsMany applications have benefited from motorized varifocal lenses that allow automatic or remote adjustment of focus distance and field of view. Applications may need to change the focal length or...